eCO2 Advanced Fractional Laser

What is the eCO2 laser?

 

“Effectively treats Scars, Smoothens the skin, Skin renewal to regain youthful-looking skin”

 The eCO2 laser is the premier fractional ablative laser that delivers exceptional, effective results using advanced technology to minimize downtime, increase patient safety and maximize comfort.

The eCO2 features the patented Controlled Chaos Technology (CCT™) to create Micro-Ablative Columns (MACs) that allows the tissue to maximize heat dissipation between shots.

This results in an increased safety profile with a reduction in post-operative discomfort and faster healing time leading to unparalleled fractional resurfacing results.

Controlled Chaos Technology (CCT™) that creates MAC columns deep into the scars / skin to achieve excellent results.

 

Conditions treated with the eCO2

  • Acne scars
  • Fine lines and wrinkles
  • Pores
  • Regenerate new skin cells
  • Skin tightening
  • Improvement in skin texture and tone
  • Pigmentation
  • Stretch marks

For those looking to regain youthful skin and a smoother skin texture, the eCO2 is the treatment for you.

The eCO2 sets itself apart from the competition with Ultra Deep Ablation depths of up to 2.4 mm.

 

How is the procedure performed?

Numbing cream will first be applied before the procedure to ensure maximum comfort during the procedure.

The procedure itself is quick and takes about 15 mins.

 

What should I expect after the procedure?

Redness is to be expected after the procedure followed by micro-crusts and should resolve in a week.

 

When will I see the results?

Results can be seen with each session and subsequent sessions may be required to achieve optimal results.

 

How often can this procedure be performed?

Each treatment interval is 4 – 6 weeks.

 

Book your initial consultation with us today

As a leading clinic in Singapore, we are proud to offer exceptional quality of care to each and every one of our clients.

Please Contact Us for further enquiries regarding acne scar removal.

 

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